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Online EL defect detector
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Online EL defect detector

Online EL defect detector

  • Brief description:Suitable for the detection of defects in crystalline silicon wafers such as visible/ hidden cracks, chips, black wafers, broken grids, sintered webs and contamination.

Technical Parameter

lInfra-red imaging camera, direct shooting

lMulti-spec module adaptation

lAutomatic power-up

lFlowing signal docking

lMES system interfacing

 

Equipment model

ST-EL10

Component size

Length: 1600-2600mm, width: 1000-1600mm

Shooting mode

Direct-shot scanning

Application type

Before to / after lamination

Access mode of the components

The feeding form can be changed according to the demand

Transfer table height

950±30mm

Test the beat

24S / tablet (released before judging)

Camera type

Dedicated HD industrial camera

Effective test area

2600×1400 mm

resolution ratio

2560×1440

Test accuracy

0.57mm/pixel

indicator

4K 50-inch ultra-clear display

constant-current power supply

Programmable power supply

current range

The 0~15A is continuously adjustable

voltage range

From 0 to 80 V is continuously adjustable

Equipment size

2920×2600×1250 mm

weight of equipment

0.8 t


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